PREPARATION OF FLUORINE-DOPED TITANIA SELF-CLEANING FILMS BY ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION

宋晨路,刘军波,翁伟浩,翁文剑
DOI: https://doi.org/10.14062/j.issn.0454-5648.2010.01.019
2010-01-01
Abstract:A fluorine (F)-doped titania (TiO2)-based film on glass for self-cleaning purposes was prepared using Ti(OC3H7)4 and CF3CH2OH (TFE) as precursors by an atmospheric pressure chemical vapor deposition method.The effect of the TFE flow rate on the properties of the films was analyzed by scanning electron microscope,X-ray diffractometer and ultraviolet visible transmission spectrum.The results show that F can be doped into the TiO2 films,and the formation of anatase phase is suppressed by adding the TFE.The optimal TFE flow rate is 5.94 L/min.
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