High-performance CdS:P Nanoribbon Field-Effect Transistors Constructed with High-Κ Dielectric and Top-Gate Geometry

Di Wu,Yang Jiang,Li Wang,Shanying Li,Bo Wu,Xinzheng Lan,Yongqiang Yu,Chunyan Wu,Zhuangbing Wang,Jiansheng Jie
DOI: https://doi.org/10.1063/1.3360206
IF: 4
2010-01-01
Applied Physics Letters
Abstract:High-performance field-effect transistors (FETs) based on single phosphorus-doped n-type CdS nanoribbon with high-κ HfO2 dielectric and top-gate geometry were constructed. In contrast to the nano-FETs that were fabricated on SiO2/Si substrate with back-gate device configuration, the top-gate FETs exhibit a substantial improvement in performances, i.e., work voltage was reduced to a small value of within ±5 V, the subthreshold swing was reduced to 200 mV/dec and the Ion/Ioff ratio was increased by about six orders of magnitude. The top-gate CdS:P nano-FET shows high sensitivity upon light irradiation, revealing that the top-gate FETs are promising candidates for nanoelectronic and optoelectronic applications.
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