Stress Impact on Dielectric Properties of Bi3.15Nd0.85Ti3O12 Films

Yunfei Liu,Yi Kan,Xiaomei Lu,Wei Cai,Xiaobo Wu,Xiumei Wu,Xiaofei Wang,HuiFeng Bo,Fengzhen Huang,Jinsong Zhu
DOI: https://doi.org/10.1063/1.3302460
IF: 4
2010-01-01
Applied Physics Letters
Abstract:Dielectric properties of Bi3.15Nd0.85Ti3O12 films under applied uniaxial stress were investigated. The results showed that the dielectric constant and loss increased with the stress changing from maximum compression (−70 MPa) to maximum tension (+70 MPa). Further studies discovered that the variation of the dielectric constant under stress was more distinct at higher testing ac field and ambient temperature. These observations were explained based on the domain wall movability related with the stress-induced domain reorientation.
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