Performance Improvement of the EEPROM Cells with the Standard Logic Process Featuring a Metal Finger Coupling Capacitor

Poren Tang,Ru Huang,Dake Wu,Yongbian Kuang,Yangyuan Wang
DOI: https://doi.org/10.1088/0268-1242/25/12/125003
IF: 2.048
2010-01-01
Semiconductor Science and Technology
Abstract:In this paper, a novel single-poly electrically erasable programmable read-only memory (EEPROM) using a metal finger coupling capacitor is proposed and fabricated with a pure logic CMOS process. The metal interconnect layer is applied to form the finger-type capacitor which can be used as the coupling capacitor in the EEPROM cell. Using the metal finger capacitor, the proposed cell exhibits the advantages of a metallic control gate and features a higher coupling ratio to achieve smaller cell area and lower program/erase voltage. The program/erase characteristics, endurance and retention performances are presented. In addition, the EEPROM cell with a stacked metal finger structure can further improve the coupling ratio. Thus, lower operation voltage can be obtained without increasing the cell area.
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