Preparation and characterization of CuAlO 2 transparent thin films prepared by chemical solution deposition method

Gang Li,Xuebin Zhu,Hechang Lei,Haifeng Jiang,Wenhai Song,Zhaorong Yang,Jianming Dai,Yuping Sun,Xu Pan,Songyuan Dai
DOI: https://doi.org/10.1007/s10971-009-2143-7
2010-01-01
Journal of Sol-Gel Science and Technology
Abstract:CuAlO 2 thin films were prepared on quartz glass and sapphire substrates by chemical solution deposition method using copper acetate monohydrate, aluminum nitrate nonahydrate and 2-methoxyethanol as starting precursor and solvent. The effects of annealing temperature on the structural, morphological, electrical and optical properties have been studied. Via the optimized annealing treatment condition, CuAlO 2 film annealed at 850 °C in nitrogen flow of 400sccm under atmosphere pressure exhibits the best performance with the lowest room temperature resistivity of 3.6 × 10 2 Ω cm and the highest optical transmission in the visible region (>70% at around 600 nm wavelength). CuAl 2 O 4 and CuO phases, not CuAlO 2 phase are obtained when annealing temperature is lower than 850 °C. However, a further increase of annealing temperature weakens the crystallization quality and deteriorates the surface morphology of CuAlO 2 films as the annealing temperature exceeds 850 °C, leading to an increase in the resistivity and a decrease of the optical transmission in the visible region of CuAlO 2 films.
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