Properties Of P-N Heterojunction Diode Based On Ge2sb2te5 And Its Application For Phase Change Random Access Memory

Li Tang,Peng Zhou,Haijun Wan,Gang Jin,Bing Chen,Tingao Tang,Yinyin Lin
DOI: https://doi.org/10.1063/1.3055417
IF: 2.877
2009-01-01
Journal of Applied Physics
Abstract:Heterojunction diodes are fabricated using p-type Ge2Sb2Te5 and low doped n-type silicon wafer. Rectification is observed with a ratio of forward-to-reverse current as high as 10(4) and 10(3) for crystal-Ge2Sb2Te5/n-Si junction and amorphous-Ge2Sb2Te5/n-Si junction, respectively. The approximate equilibrium energy-band diagrams for both crystal-Ge2Sb2Te5/n-Si heterojunction diodes and amorphous-Ge2Sb2Te5/n-Si heterojunction diodes are proposed to explain the properties of the p-Ge2Sb2Te5/n-Si heterojunction diode. Properties of a p-n heterojunction diode based on Ge2Sb2Te5 are proposed to apply in 0T1R cross-point structure array for reliable read operation and for decreasing the sneaking current.
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