Tuning Magnetic Properties Of Yttrium Iron Garnet Film With Oxygen Partial Pressure In Sputtering And Annealing Process

Qinghui Yang,Huaiwu Zhang,Qiye Wen,Yingli Liu,John Xiao
DOI: https://doi.org/10.1063/1.3055286
IF: 2.877
2009-01-01
Journal of Applied Physics
Abstract:In this paper, the magnetic properties of these films which deposited and annealed at different atmospheres were investigated. The experimental results show that the magnetic properties of yttrium iron garnet films prepared by rf magnetron sputtering method can be tuned with oxygen partial pressure in sputtering and annealing processes. The optimal condition is depositing in atmosphere of R=0 and annealing at 0.5 Pa O-2, or depositing in atmosphere of R=2% and annealed in vacuum. (C) 2009 American Institute of Physics. [DOI: 10.1063/1.3055286]
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