The Preparation and Behavior in Annealing of the Yttria Dispersed Ferrum Films

李正操,余晓毅,苗伟,马天,张政军
DOI: https://doi.org/10.3969/j.issn.1000-2618.2010.03.004
2010-01-01
Abstract:In order to investigate the yttria dispersed strength effect in thin films,double-target magnetron sputtering was carried out to prepare the yttria dispersed ferrum films.Crystal structure,composition,thickness and nano hardness were examined by X-ray diffraction,X-ray fluorescence,scanning electron microscope and nanoindenter.The films were annealed at enhancing temperature in a quartz tube after being vacuumed.Experimental results indicate that the nano hardness of ferrum films was enhanced significantly after 500 ℃ vacuum annealing,and the enhancing rate increased with the doping rate of yttria. This may provide reference for improving the mechanical property of ODS alloy.
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