Electroless Plating Of Copper Nano-Coned Array For High Reliability Packaging

Pan Zhongwen,Hu Anmin,Hang Tao,Duan Yingying,Li Ming,Dali Mao
DOI: https://doi.org/10.1109/ICEPT.2009.5270544
2009-01-01
Abstract:Nano-coned array of Cu were prepared by electroless plating with special crystallization conditioning agent. The morphologies of nano-coned array were observed by FE-SEM. The influences of active time in PdCl2, concentration. of NiSO4 center dot 6H(2)O, crystallization conditioning agent, pH and temperature of plating solution were discussed. Then, the possible reasons of the influence on the growth of nano-coned array were investigated. NiSO4 center dot 6H(2)O was proved as catalytic active agent. The optimum preparation conditions were fixed. The crystal crystallographic orientation and elements of the nano-coned array were measured using TEM and EDX. The nano-cones consist of 95.57% copper and 4.43% nickel. The crystal crystallographic orientation of them is typical copper FCC single crystal.
What problem does this paper attempt to address?