Simulation of Temperature Field in the Deposition of Diamond by Hot Filament CVD

左伟,沈彬,孙方宏,陈明
DOI: https://doi.org/10.16183/j.cnki.jsjtu.2008.07.009
2008-01-01
Abstract:In order to optimize the process of diamond coating with hot filament chemical vapor deposition(HFCVD) equipment,a new method by using finite element simulation was proposed to analyze the influences of hot filaments parameters on the uniformity of substrate temperature and temperature field.In addition,the simulation was validated by depositing diamond films and single diamond crystals with HFCVD equipments.The results of the simulation and experiments show that the arrangement of filaments and the distance between filaments and substrate are the key attributes of diamond coating quality.
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