Abstract:<p>Developing a comprehensive understanding of the modification of material properties by neutron irradiation is important for the design of future fission and fusion power reactors. Self-ion implantation is commonly used to mimic neutron irradiation damage, however an interesting question concerns the effect of ion energy on the resulting damage structures. The reduction in the thickness of the implanted layer as the implantation energy is reduced results in the significant quandary: Does one attempt to match the primary knock-on atom energy produced during neutron irradiation or implant at a much higher energy, such that a thicker damage layer is produced? Here we address this question by measuring the full strain tensor for two ion implantation energies, 2 MeV and 20 MeV in self-ion implanted tungsten, a critical material for the first wall and divertor of fusion reactors. A comparison of 2 MeV and 20 MeV implanted samples is shown to result in similar lattice swelling. Multi-reflection Bragg coherent diffractive imaging (MBCDI) shows that implantation induced strain is in fact heterogeneous at the nanoscale, suggesting that there is a non-uniform distribution of defects, an observation that is not fully captured by micro-beam Laue diffraction. At the surface, MBCDI and high-resolution electron back-scattered diffraction (HR-EBSD) strain measurements agree quite well in terms of this clustering/non-uniformity of the strain distribution. However, MBCDI reveals that the heterogeneity at greater depths in the sample is much larger than at the surface. This combination of techniques provides a powerful method for detailed investigation of the micro structural damage caused by ion bombardment and more generally of strain related phenomena in micro-volumes that are inaccessible via any other technique.</p>

MeV Ti ion-implantation-induced damages in LiNbO3

Formation of Optical Waveguide and Annealing Behaviour of LiNbO 3 Implanted by 3.0-Mev Nickel Ions

Planar Optical Waveguides In Knbo3 Formed By Mev B And He Ion Implantation

Lattice Damage, Optical and Electrical Properties Induced by H and C Ions Implantation in Nd:YLF Crystals

MgO:LiNbO3 Planar Waveguide Formed by MeV O2+ Implantation and Its Annealing Characteristics

High energy He+ ion implantation in titanium doped sapphire crystal

Investigation of H+ and B+/H+ implantation in LiTaO3 single-crystals

Fabrication and characteristics of the C3+‐ion implanted and femtosecond‐laser ablated RTP 2D waveguide

Effects of Ion Channeling and Co-Implants on Ion Ranges and Damage in Si: Studies With PL, SRP, SIMS and MC Models

Surface Modification of LiNbO3 and KTa1−xNbxO3 Crystals Irradiated by Intense Pulsed Ion Beam

Modeling of ion beam induced damage in Si during channeling Rutherford backscattering spectrometry analysis

Near-infrared Carbon-Implanted Waveguides in Tb3+-doped Aluminum Borosilicate Glasses

Characterisation of Inhomogeneities in Ti:LiNbO$_3$ waveguides

The Measurement of Photorefractive Damage Threshold of Near-stoichiometric LiNbO3 Crystals

Formation of optical waveguides in KNbO3 by MeV boron ion implantation

Second harmonic and raman imaging of He+ implanted KTiOPO4 waveguides

Analysis of Implantation-Induced Damage and Amorphization of Gasb

Optical and magnetic properties in well and barrier ZnS waveguides formed by MeV Ni and Cu ion implantation

Nanoscale lattice strains in self-ion implanted tungsten

Optical Damage Resistance in LiNbO3 Crystals Doped with Tetravalent Ions

Characterization of Radiation Damage Induced by B and B4 Ion Implantation into Silicon