Abstract:Solar cells of p-CIS/n-buffer/ZnO type, where CIS is (CuInS2, CuInSe2 or intermediates, are thin-film-based devices for the future high-efficiency and low-cost photovoltaic devices. As important thin film, the properties of Al-doped ZnO (AZO) directly affect the parameter of the cell, especially for large volume. In the present paper, AZO semiconductor transparent thin film on soda-lime glass was fabricated using cylindrical zinc-aluminum target, which can not only lower the cost of the target but also make the preparation of large area AZO thin film more easily. Using the DC magnet sputtering techniques and rolling target, high utilization efficiency of target was achieved and large area uniform and directional film was realized. An introduction to DC magnet sputtering techniques for large area film fabrication is given. With different measurement methods, such as X-ray diffraction (XRD) and scan electron microscope (SEM), we analyzed large size film's structure, appearance, and electrical and optical characteristics. The XRD spectrum indicated that the AZO film shows well zinc-blende structure with a preferred (002) growth and the c-axis is oriented normal to the substrate plane. The lattice constant is 5.603 9 nm and the mismatch with CdS thin film is only 2 percent. It absolutely satisfied the demand of the GIGS solar cell. The cross-section of the AZO thin film indicates the columnar structure and the surface morphology shows that the crystal size is about 50 nm that is consistent with the result of XRD spectrum. By the optical transmission curve, not only the high transmission rate over 85 percent in the visible spectrum between 400 nm and 700 nm was showed but also the band gap 3.1 eV was estimated. And all these parameters can meet the demand of the large area module of GIGS solar cell. The result is that using alloy target and Ar gas, and controlling the appropriate pressure of oxygen, we can get directional, condensed, uniform, high transmitting rate, low resistance and large size (300 mm x 300 mm) AZO film.

Properties of Zinc Aluminum Oxide Films and Its Ceramic Target Fabrication

Fabrication and Characterization of Y2O3 Stabilized ZrO2 Films Deposited with Aerosol-Assisted MOCVD

Deposition and Characterization of AZO Thin Films on Flexible Glass Substrates Using DC Magnetron Sputtering Technique

Microstructure and Optical Properties of ZnO Films Deposited by Radio-frequency Reactive Magnetron Sputtering

Research on preparation and properties of ZnO:AI (ZAO) thin films

Al-doped ZnO (ZAO) Films Prepared by Middle-frequency Alternative Magnetron Sputtering

Study on Deposition Parameters of ZAO Films by AC Magnetron Sputtering

Li-Doped Zno Ceramic Target Preparation And Rf Magnetron Sputtering Zno Films

Effect of technologic parameters on the performances of ZAO thin films deposited by magnetron sputtering

Properties of transparent conductive ZnO:Al thin films prepared by magnetron sputtering

Study on the Preparation of ZYO Thin Films by Middle Frequency Alternative Magnetron Sputtering and Their Properties

Growth and Properties of Y-Doped Zinc Oxide by Mid-Frequency Alternating Magnetron Sputtering

Prepareation of Large Area Al-ZnO Thin Film by DC Magnetron Sputtering

Study on the preparation and the film-forming properties of Mo-and Al-doped ZnO ceramic targets

Effect of Substrate Temperature on Performance of ZAO Thin Films Deposited by Magnetron Sputtering

Substrate temperature dependence of the properties of ZAO thin films deposited by magnetron sputtering

Textured Surface Aluminum-Doped Zinc Oxide Thin Films Prepared by Direct Current Magnetron Sputtering

Influences of Substrate Temperature on Properties of ZGO Thin Films Prepared by Middle-frequency Alternative Magnetron Sputtering

Deposition and Characterization of Sputtered ZnO Films

Microstructure and Electrical Properties of Al-doped ZnO Thin Films

Spectroscopic characterization of the plasmas formed during the deposition of ZnO and Al-doped ZnO films by plasma-assisted pulsed laser deposition