Abstract:Highly optically transparent and electrically conductive Al-doped ZnO (AZO) thin films with varied Al concentrations were synthesized by means of reactive deposition of ZnO host films and in-situ doping of Al by pulsed laser co-ablation of a Zn target and an Al target with the assistance of an oxygen plasma. The optical and electrical properties of AZO films were tailored by the adjustment of Al concentration which was realized by varying the laser fluence on the Al target. The morphology, composition and structure as well as the optical and electrical properties were characterized and the effects of Al doping and post-deposition annealing were investigated. Similar with undoped ZnO, the synthesized AZO films have a hexagonal wurtzite structure with the crystallinity deteriorated, present high visible transparency with the absorption edge blue shifted and show good electrical properties with the electrical conductivity increased. The structural, optical and electrical properties are strongly dependent on Al concentration and are significantly improved after annealing in H2/N2 mixed gas. Annealed AZO films containing 3.0at% Al have optical properties including an absorption edge near 325nm and an optical band gap of 3.67eV and electrical properties covering an electrical resistivity of 5.27 × 10−4Ωcm and a carrier concentration of 1.11 × 1021cm−3 with a Hall mobility of 10.7cm2/V s.

Effect Of Thickness On Structural, Electrical, And Optical Properties Of Zno : Al Films Deposited By Pulsed Laser Deposition

Effect of Nucleation and Growth Kinetics on the Electrical and Optical Properties of Undoped ZnO Films

The growth of nanoscale ZnO films by pulsed-spray evaporation chemical vapor deposition and their structural, electric and optical properties

Effect of Film Thickness on Properties of Al-Doped Zno Film As Transparent Conducting Electrodes in Oleds

Effect of the ZnO buffer layer thickness on AZO film properties

Deposition and Characterization of AZO Thin Films on Flexible Glass Substrates Using DC Magnetron Sputtering Technique

The Effects of Oxygen Partial Pressure and Substrate Temperature on the Structural and Optical Properties of Zno Films

Thickness Study of AZO Films by RF Sputtering in Ar + H2 Atmosphere at Room Temperature

Microstructure and Electrical Properties of Al-doped ZnO Thin Films

Studies on Morphology, Electrical and Optical Characteristics of Al-doped ZnO Thin Films Grown by Atomic Layer Deposition

Influence of Al Doping on the Properties of Zno Thin Films Grown by Atomic Layer Deposition

Structural, Electrical, and Optical Properties of ZnInO Alloy Thin Films

Effect of film thickness on structural and optical properties of sol-gel spin coated aluminum doped zinc oxide (Al:ZnO) thin films

Structural and Optoelectronic Properties of AZO Thin Films Prepared by RF Magnetron Sputtering at Room Temperature

Optical and Electrical Properties of Al-doped ZnO Thin Films by Atomic Layer Deposition

Al-Doping Effects on Structure, Electrical and Optical Properties of C-Axis-Orientated Zno : Al Thin Films

Micrographs and Optical Properties of Al-Doped Zno Thin Films Deposited by Radio Frequency Magnetron Sputtering

Optical properties of ultrathin ZnO films fabricated by atomic layer deposition

Tailoring of Optical and Electrical Properties of Transparent and Conductive Al-doped ZnO Films by Adjustment of Al Concentration

Influences Of Different Buffer Layers On Al-Doped Zno Flims Deposited By Rf Magnetron Sputtering

Effects of deposition power and pressure on the crystallinity of Al-doped ZnO thin films at glass substrates by low temperature RF magnetron sputtering