Abstract:Amorphous diamond(a-D) films deposited by filtered cathodic vacuum arc(FCVA) technology with different substrate bias were investigated.The mechanical properties were characterized with nanoindenter and the stress was calculated using Stoney equation.The optical properties were analyzed by spectroscopic ellipsometry and the microstructure was investigated by visible Raman spectroscopy and electron energy loss spectroscopy.The maximal hardness and elastic modulus consorting with the highest stress are presented as the negative substrate bias is 80V. With the bias increases or decreases,hardness,elastic modulus and stress descend gradually.However,the high impinging energy benefits the adhesion between the films and the substrate.Additionally,the optical gap and the refractive index exhibits the same changing regularities,whereas the minimal extinction coefficient is obtained at negative bias of 80V.It is found that the negative bias of 80V is the sp~3-rich deposition condition according to the EELS measurements and the Raman slope coefficient.The changing rules of the mechanical and optical properties can be explained in light of the growth mechanism and microstructure of the films.In short,a-D films deposited by the FCVA technology are good at the infrared protective coatings because the films are transparent in the wide infrared band and the microstructure and properties can be modulated.

C 1s Photoemission Investigation of Substrate Bias and Annealing Temperature Influencing the Microstructure of Amorphous Diamond Films

Synthesis, structure and applications of amorphous diamond

A Comparative Raman Study of Thermal Stability of Amorphous Diamond Films Deposited with Different Substrate Bias

Photoemission Study of Amorphous Carbon Modifications and Comparison with Calculated Densities of States

Optical and Electronic-Properties of Amorphous Diamond

Effect of Substrate Bias on Microstructure and Properties of Tetrahedral Amorphous Carbon Films

A Study of Field Electron Emission Phenomenon Associated with Amorphous Diamond Thin Films

Optical Properties of Amorphous Diamond Films Evaluated by Non-Destructive Spectroscopic Ellipsometry

Electron Field Emission Studies from Amorphous Carbon Thin Films

Optical-Properties of Amorphous C/Diamond Thin-Films

Spectroscopic Ellipsometry Investigations of Amorphous Diamond Films Deposited with Filtered Arc

Influence of annealing on microstructures and photoluminescence of nano-composite silicon film

Influence of Dc Bias Voltage on the Refractive-Index and Stress of Carbon-Diamond Films Deposited from A Ch4/Ar Rf Plasma

Dependences of Amorphous Structure on Bias Voltage and Annealing in Silicon–carbon Alloys

Modeling of the Electron Field Emission Process in Polycrystalline Diamond and Diamond-Like Carbon Thin Films

The Intrinsic Relation Between Field Electron Emission and Structure Characteristics of Amorphous Diamond Film

Superexcellent Infrared Protective Coatings : Amorphous Diamond Films Deposited by Filtered Cathodic Vacuum Arc Technology

Effect of in Situ Cs Treatment on the Field Emission Characteristics of Amorphous Diamond Films

S P 3 -Rich Deposition Conditions and Growth Mechanism of Tetrahedral Amorphous Carbon Films Deposited Using Filtered Arc

Correlations between substrate bias, microstructure and surface morphology of tetrahedral amorphous carbon films

Microstructural Modification of Diamond-Graphite Nanohybrid Films Via Adjusting Deposition Temperatures for Enhanced Electron Field Emission