Abstract:Laser-induced damage of fused silica optics at 351 nm is a key factor limiting the output energy of high-power laser facility, especially the damage growth process. A comprehensive understanding of its damage growth behavior is of critical importance for high-power laser facility. Thus we study the laser-induced damage growth on the exit surface of fused silica under the subsequent illumination of 5 ns square pulses at 351 nm on a large-aperture high-power laser facility. Experiment is conducted with a 36 cm thick UV grade fused silica focus lens in clean atmosphere and at room temperature. 56 laser shots of 3 fluence in a range from 0.1 J/cm2 to 8.1 J/cm2 are fired during the experiment. And the damage initiation process and growth process are monitored and recorded with an online optics damage inspection instrument which has an optical resolution of about 50 m. Experimental results demonstrate that the sizes of exit-surface damage sites exponentially or linearly grow with laser shots and the damage growth rate increases with laser fluence. However, it is found that even under the same laser conditions the damage grow rate is not a fixed value, which means that besides the laser fluence other parameters also influence the damage grow process. In order to highlight some tendencies, we consider the single-shot damage growth rate and calculate the average of inside fluence bins. Statistical analysis shows that smaller sites tend to grow with larger growth rates than larger sites under the irradiation of the same laser fluence. This result indicates that damage growth rate is influenced by both laser fluence and damage site size. It suggests that the damage growth rule needs to be incorporated into a size-dependent growth effect. The result that higher growth rates are obtained for small damage sites may be related to the damage growth mechanism of fused silica. Damage crater of fused silica consists of a central core and numerous surrounding cracks. The defects in the central core absorb laser energy and yield plasma, then the plasma pressure will open the cracks on the periphery of the crater and lead to lateral and axial expansion of cracks which can be identified as damage growth. The fact that smaller sites grow faster than larger sites implies that smaller sites more efficiently couple laser energy into fracture energy. Our results have important implications for both the prediction of fused silica optics lifetime and the fundamental understanding of laser damage mechanism.

Time-resolved Dynamics of 355-Nm Laser-Irradiated Surface Damage on Fused Silica

Behavior of 355 nm laser-induced damage growth in fused silica

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Ultrafast Process Characterization of Laser-Induced Damage in Fused Silica Using Pump-Probe Shadow Imaging Techniques

Dynamics of filamentary damage induced by nanosecond laser in fused silica

Enhancing the Expansion of a Plasma Shockwave by Crater-Induced Laser Refocusing in Femtosecond Laser Ablation of Fused Silica

Laser-induced Damage Growth of Fused Silica at 351 Nm on a Large-Aperture High-Power Laser Facility

Study on damage characteristics of fused silica glass induced by plasma shock wave with finite element method

Mechanisms In Fs-Laser Ablation In Fused Silica

Characterization of artificial indentation defects in fused silica surface and its damage performance under 355 nm nanosecond laser

Micron-size bubble defects in fused silica and its laser induced damage near 355 nm

Laser-induced damage growth of large-aperture fused silica optics under high-fluence 351 nm laser irradiation

Interaction between sub-picosecond laser and fused silica

Laser-induced Periodic Annular Surface Structures on Fused Silica Surface

Effect of laser ablation on the conductivity and laser-induced damage threshold of fused silica components

Dynamics and its modulation of laser-induced plasma and shockwave in femtosecond double-pulse ablation of silicon

Repair of Fused Silica Damage Using Selective Femtosecond Laser-Induced Etching

Femtosecond-Laser-Ablation Dynamics in Silicon Revealed by Transient Reflectivity Change

Femtosecond laser ablation of crystals SiO2 and YAG

Material migration and damage characteristics of fused silica optical surface treated by CO 2 laser/short – pulse ultraviolet laser

Strong UV laser absorption source near 355 nm in fused silica and its origination