Effect of annealing on etching profile of sacrificial layer and etching rate

Changju Wu,Faxin Yu,Zhonghe Jin,Huilian Ma,Yuelin Wang
DOI: https://doi.org/10.3321/j.issn:0254-3087.2006.07.023
2006-01-01
Abstract:The growth technology of the samples is first described. Then the profile of etching front is studied and the forming factors of the triangle at etching front are analyzed. The results show that the major factor of the triangle formation is stress. Through the study on the mechanism of the effects of annealing treatment on etching rate, several laws are obtained, which show that different annealing conditions have different effects on the etching rate.
What problem does this paper attempt to address?