New super hard Ti-Si-C-N nanocomposite coatings deposited by pulsed DC plasma CVD

GengRong Chang,Yan Guo,Shengli Ma,Kewei Xu
2006-01-01
Rare Metal Materials and Engineering
Abstract:Using a pulsed dc plasma chemical vapor deposition technology, a new class of quaternary Ti-Si-C-N coatings were deposited on HSS substrate at 550 degrees C. The chemical composition and the hardness of coatings could be well controlled through the adjustment of CH4 and SiCl4 flow rate. Results indicate that the Ti-Si-C-N coatings have a nanocomposite structure of TiN/TiC/Ti(C,N)/a-C/a-Si3N4 with a mixed orientations of [111], [220] and [200]. On the other hand, the change of C content has a little effect on the hardness of,coatings. However, the surface morphologies of Ti-Si-C-N coatings changed from granular to strip-shaped with the increase of Si and C content, and the hardness of coatings reaches a maximum value of about 52 GPa at content of 9 at% Si and 24 at% C.
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