Ti(C,N) Hard Coatings Prepared by Pulsed High Energy Density Plasma

H Miao,Z Peng,W Pan,L Qi,S Yang,C Liu
DOI: https://doi.org/10.4028/www.scientific.net/kem.264-268.605
2004-01-01
Key Engineering Materials
Abstract:A new technique, namely pulsed high energy density plasma, has been developed to deposit hard coating of metals and various compound materials on ceramic and metal substrates. In this system, the plasma density was in the range of 10(14)-10(16) cm(-3) in the glow discharge space; the electron temperature was in the range of 10(5)-10(6) K; the power density was varied from 10 5 to 101 W(.)cm(-2); the pulse width is about 60 mus and the pulse frequency is 10(-2) s(-1). In this study, Ti(C,N) hard coatings were deposited on Si3N4 ceramic cutting tool substrates at room temperature, resulting coatings with high hardness and excellent adhesion to the substrates. The adhesion force of the Ti(C,N) coatings is in the range of 80-100 mN measured by nanoscratch tests, and the nanohardness of the coatings varied from 40 GPa to 50 GPa as measured by a nanoindenter. The tribological properties and the cutting performances of the coated tools were evaluated by turning HT 250 (HB230) steel under industrial conditions. The wear resistance and edge life of the tools were improved dramatically because of the deposition of Ti(C,N) coatings. From the structural analyses, these improvements were attributed to a combination of three effects: deposition, ion implantation and quenching.
What problem does this paper attempt to address?