Study of TiAlN coatings deposited by continuous high power magnetron sputtering (C-HPMS)

Liangliang Liu,Lin Zhou,Wei Tang,Qingdong Ruan,Xiaoyuan Li,Zhongcan Wu,Abdul Mateen Qasim,Suihan Cui,Tijun Li,Xiubo Tian,Ricky K.Y. Fu,Zhongzhen Wu,Paul K. Chu

DOI: https://doi.org/10.1016/j.surfcoat.2020.126315

IF: 4.865

2020-11-01

Surface and Coatings Technology

Abstract:<p>TiAlN coatings are widely used in high-speed cutting, machining, and other high-temperature applications. However, owing to the high cathode temperature, large amounts of metal droplets are produced during fabrication in arc ion plating (AIP) and the shadowing effect introduces particles and voids in the coatings. Continuous high-power magnetron sputtering (C-HPMS) can produce high ionization rates similar to high-power impulse magnetron sputtering (HiPIMS) and high deposition rates similar to AIP. In this work, the morphology, adhesion strength, tribological properties, corrosion resistance, and oxidation resistance of Al-rich TiAlN coatings prepared by C-HPMS are studied systematically. Higher Al and Ti ionization rates and deposition rates are achieved by increasing the power density. The largest deposition rate is 0.45 μm/min and coating hardness is 34.4 GPa. More importantly, no particles are produced as manifested by small surface roughness of 17.8 nm.</p>

physics, applied,materials science, coatings & films

What problem does this paper attempt to address?

The paper primarily explores the issue of preparing aluminum-rich TiAlN coatings using Continuous High Power Magnetron Sputtering (C-HPMS) technology. The research aims to address problems present in traditional Arc Ion Plating (AIP) technology, such as the generation of a large amount of metal splashes during the preparation process, which leads to a decline in coating performance.

Specifically, the research work in the paper includes the following aspects:

1. **Technical Background and Challenges**: TiAlN coatings are widely used in high-speed cutting, machining, and other high-temperature applications due to their excellent mechanical properties. However, in traditional AIP technology, the high cathode temperature leads to the generation of a large amount of metal splashes, which not only increases surface roughness but also forms particles and voids in the coating, thereby affecting the coating's performance, especially in applications such as micro-drilling and precision cutting tools.

2. **Advantages of C-HPMS Technology**: C-HPMS technology can achieve a high ionization rate similar to High Power Impulse Magnetron Sputtering (HiPIMS) and has a high deposition rate comparable to AIP. This method can effectively reduce or eliminate the generation of metal splashes, thereby improving the quality of the coating.

3. **Experimental Methods and Results**: The study prepared different TiAlN coatings by varying the power density and systematically investigated their morphology, adhesion strength, tribological properties, corrosion resistance, and oxidation resistance. The results showed that with the increase in power density, the ionization rates of Ti and Al and the deposition rate also increased. More importantly, the TiAlN coatings prepared by C-HPMS technology had a very smooth surface (surface roughness as low as 17.8 nm) with no significant particles present.

4. **Conclusion**: By optimizing the conditions, C-HPMS technology can efficiently prepare particle-free, high-quality aluminum-rich TiAlN coatings. These coatings exhibit a hardness of up to 34.4 GPa, an adhesion strength of 75 N, and excellent tribological properties, corrosion resistance, and oxidation resistance. This technology and its related mechanisms provide new ideas and guidance for developing splash-free hard coatings.