Effects of Carbon Content and Annealing Temperature on the Microstructure and Hardness of Super Hard Ti–Si–C–N Nanocomposite Coatings Prepared by Pulsed D.c. PCVD

Yan Guo,Shengli Ma,Kewei Xu
DOI: https://doi.org/10.1016/j.surfcoat.2006.07.122
2007-01-01
Abstract:Novel quaternary Ti-Si-C-N. coatings composed of nanocrystalline Ti(C, N), amorphous phases Of Si3N4 and C, and occasionally free Si and nanocrystalline TiSi2 were deposited on high-speed steel (HSS) substrate at 550 degrees C using pulsed d.c. plasma chemical vapor deposition (PCVD) technique from TiCl4, SiCl4, CH4, N-2, H-2 and Ar mixtures. It was found that the hardness increased with the increase of C content and reached the maximum value of approximately 48 GPa at the C content of 38.6 at.%. However, the crystallite size decreased to a minimum value of approximately 7 mn at the content of 38.6 at.% C. It could be detected that crystallite size and hardness almost remained stable during annealing up to 900 degrees C for Ti-SiC-N coatings. However, a sharp decrease in the hardness was observed after annealing at 1000 degrees C due to the growth of grain. A shift of the diffraction peaks was towards higher 20 for Ti-Si-C-N coatings after annealing at increasing temperatures because of evaporation of CO, and resultant loss of C from coating at elevated temperature. In addition, SiOx, TiOx were detected in Ti-Si-C-N coatings after annealing at 1100 degrees C. (C) 2006 Elsevier B.V. All rights reserved.
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