Abstract:NiSi-NiCr thin film thermocouples (TFTCs) have significant application value as contact temperature sensors in cutting temperature measurements owing to their fast response and negligible volume. However, due to the relatively high chemical activity of Ni-based alloys, high-temperature oxidation strongly affects the operational reliability of NiSi-NiCr TFTCs. In this respect, depositing an anti-oxidation coating onto the surface of NiSi-NiCr TFTCs is considered an effective way to protect them in high-temperature environments. In this study, NiSi and NiCr films were deposited on cemented carbides and annealed at 200 °C-600 °C in air. Scanning electron microscope, X-ray diffraction spectroscopy, X-ray photoelectron spectroscopy, and four-probe resistivity tests were used to characterize the microstructure and resistivity of NiSi and NiCr film. Then SiNxOy films were deposited onto the NiSi and NiCr films and compared with uncoated samples after annealing at 600 °C. The effect of SiNxOy films on the thermal stability and thermoelectric output of NiSi-NiCr TFTCs was investigated. The results show that the NiSi film was partially oxidized at 200 °C and entirely oxidized when the temperature exceeded 400 °C. The completely oxidized NiSi films had evident defects and cracks, and the resistivity increased by a factor of over 1000. The NiCr film could not be completely oxidized at 600 °C, which is attributed to the formation of Cr2O3 as an external oxide barrier layer. Below 600 °C, SiNxOy films could effectively protect NiSi and NiCr films from oxidation. Thus, the addition of SiNxOy film increases the maximum temperature at which NiSi-NiCr TFTCs can be used.

Electrical Stability of Cr-Si-Ni Resistive Films in Acidic and Alkaline Aqueous Solutions

Electrical Stability and Degradation Mechanism of CrSi(Ni, Al) Resistive Films in Alkaline Aqueous Environments

Corrosion Behavior of Sputtered Cr–Si–Ni Resistive Films in Acidic and Alkaline Environments

Environmental Effects on Electrical Properties of Cr–Si–Ni Resistive Films Deposited by Magnetron Sputtering

Corrosion Behavior of Sputtered Cr–Si–Ni and Cr–Si–Ni–Al Resistive Films in 0.1M NaOH

Effect of Nitrogen on Crystallization Behavior and Electrical Properties of Cr-Si-Al Resistive Films

Microstructure and Electrical Resistivity of Cr-Si-Ni Films Deposited on Si Substrates

Crystallization and Oxidation Behaviors of Cr-Si-Ni-N Resistive Films

Comparison of NiCr-O and Cr-Si Thin Film Resistors with Mid-Range of Electric Resistance

Silicon Content Design of CrSiN Films for Good Anti-Corrosion and Anti-Wear Performances in NaOH Solution

The Role of Aluminum in the Crystallization of Cr–Si–Ni Resistive Films

Microstructure and Electrical Characteristics of Cr–Si–Ni Films Deposited on Glass and Si (100) Substrates by RF Magnetron Sputtering

Effect of Substrate Bias on the Microstructure and Properties of Non-Equimolar (alcrsitizr)n Films with Different Cr/Zr Ratios Deposited Using Reactive Direct Current Magnetron Sputtering

The Crystallization of Cr–Si–Ni–Al Amorphous Films—nucleation and Growth of Intermetallic Phase Cr(Al,Si)2

The Influence of Zirconium on the Crystallization Behavior and Electrical Properties of Cr–Si–Al Resistive Films

Electrical Switching of Al-Doped Amorphous SiO<sub>x</sub> Thin Films

Corrosion Behavior of Nanostructured Ni‐Si3N4 Composite Films: A Study of Electrochemical Impedance Spectroscopy

Effects of silicon content on the structure and mechanical properties of (AlCrTaTiZr)–Si<sub><i>x</i></sub>–N coatings by reactive RF magnetron sputtering

Thermal stability and electrical characteristics of NiSi films with electroplated Ni(W) alloy

Oxidation Behaviour of NiSi-NiCr Thin Film Thermocouples and Antioxidation Effect of SiNxOy Film

Effects of silicon content on the structure and mechanical properties of (AlCrTaTiZr)–Six–N coatings by reactive RF magnetron sputtering