Substrate temperature dependence of the properties of ZnO:Al thin films prepared by medium frequency sputtering

Yu Huang,Qiang Xiong,JunMing Xue,Tiehua Ma,Jian Sun,Ying Zhao,Xinhua Geng
2006-01-01
Abstract:The performances of ZnO:Al(ZAO) thin films are related to the substrate temperature during sputtering. The influence of substrate temperature on the performances of ZnO:Al thin films prepared by medium frequency magnetron sputtering were studied using a Zn target with 2 wt% Al. The ZAO film suitable for thin film solar cells were obtained, whose thickness, resistivity, carrier concentration and Hall mobility are 700 nm, 4.6 × 10 -4 Ω·cm, 1.98 × 10 20 cm -3 and 61.9 cm 2/(V·s) respectively. The average optical transmittance is over 85% within visible light (400-800 nm).
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