Growth of Nd:LuVO4 Films by Pulsed Laser Deposition

WANG Xiao-xia,LI Hong-xia,ZHANG Huai-jin,WANG Ji-yang,SHEN Ming-rong,FANG Liang,NING Zhao-yuan
DOI: https://doi.org/10.3969/j.issn.1000-985x.2005.02.006
2005-01-01
Abstract:The(200)dominated Nd:LuVO_4 films were successfully fabricated on(100)Si and polished SiO_2 under different temperatures of substrates and different oxygen pressures.By XRD,it is shown that a film with good crystallization was deposited at about 700℃ and 10Pa.The effective refractive index is 2.0452,which was measured by prism coupler method.The surface morphology of Nd:LuVO_4 films was observed by SEM.
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