Structural, Ferroelectric, Dielectric Properties and Leakage Characteristics of Neodymium-Doped Bi 4 Ti 3 O 12 Thin Films Prepared by Metalorganic Deposition Method

W Li,J Ma,CH Song,P Bao,XM Lu,JS Zhu,YN Wang
DOI: https://doi.org/10.1088/0256-307x/21/3/036
2004-01-01
Chinese Physics Letters
Abstract:Thin films of Nd3+ -substituted Bi3.15Nd0.85Ti3O12 (BNT) were fabricated on the (111)Pt/TiO2/SiO2/Si substrates by a metalorganic deposition (MOD) technique. These thin films are possessed of a single-phase bismuth-layered structure showing the preferred (001) and (117) orientation. The values of the remanent polarization P-r and coercive held E-c of the BNT thin film are 27 muC/cm(2) and 157kV/cm, respectively. The results of fatigue and retention tests revealed that the BNT thin film was not fatigued up to 1.44 x 10(10) switching cycles and the retained charge was unchanged after 1 x 10(5) s. The leakage current behaviour of the BNT thin film was investigated at room temperature and their conduction mechanisms were also discussed. The I-V characteristics of the film show the ohmic behaviour for applied held lower than 40kV/cm. Noillinearity in the I-V behaviour was observed at an applied held above 40kV/cm. In the high held region (E > 95kV/cm) the sample shows Schottky emission.
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