Effects of Nd Doping on Structure and Properties of Bi_(4-x)Nd_xTi_3O_(12) Ferroelectric Thin Films

Hong Yan
2013-01-01
Abstract:Bi4-xNdxTi3O12 ferroelectric films fabricated on p-Si substrates by magnetron sputtering.The effects of Nd doping on structure and properties of Bi4-xNdxTi3O12 films were investigated.Bi4-xNdxTi3O12 films had the same structure as Bi4Ti3O12 with smaller and more uniform grains.The dielectric and ferroelectric properties of Bi4-xNdxTi3O12 films were improved by Nd doping.Bi4-xNdxTi3O12 films have better dielectric and ferroelectric properties with Pr = 20.6 μC/cm2,Ec 150 kV/cm,er 250,tanδ 0.1 and clockwise C-V curves of Ag/Bi4-xNdxTi3O12/ p-Si with a memory window of 1.6 V when x = 0.300.40,while an excessive Nd(x 0.45) doping would lead to bad dielectric and ferroelectric properties.
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