Abstract:An experimental and numerical study of the laser-induced damage of the surface of optical material in the femtosecond regime is presented. The objective of this work is to investigate the different processes involved as a function of the ratio of photon to bandgap energies and compare the results to models based on nonlinear ionization processes. Experimentally, the laser-induced damage threshold of optical materials has been studied in a range of wavelengths from 1030 nm (1.2 eV) to 310 nm (4 eV) with pulse durations of 100 fs with the use of an optical parametric amplifier system. Semi-conductors and dielectrics materials, in bulk or thin film forms, in a range of bandgap from 1 to 10 eV have been tested in order to investigate the scaling of the femtosecond laser damage threshold with the bandgap and photon energy. A model based on the Keldysh photo-ionization theory and the description of impact ionization by a multiple-rate-equation system is used to explain the dependence of laser-breakdown with the photon energy. The calculated damage fluence threshold is found to be consistent with experimental results. From these results, the relative importance of the ionization processes can be derived depending on material properties and irradiation conditions. Moreover, the observed damage morphologies can be described within the framework of the model by taking into account the dynamics of energy deposition with one dimensional propagation simulations in the excited material and thermodynamical considerations.

Femtosecond Breakdown and Pre-Breakdown Behavior in Thin Dielectric Films

Femtosecond laser pulse filamentation versus optical breakdown in H 2 O

Optical Breakdown For Silica And Silicon With Double Femtosecond Laser Pulses

Laser-induced damage thresholds of bulk and coating optical materials at 1030 nm, 500 fs

Different Tendencies of Breakdown Threshold on Pulse Duration in the Subpicosecond Regime in Fused Silica

Femtosecond Laser Pulse-Train Induced Breakdown in Fused Silica: the Role of Seed Electrons

Optical Breakdown Versus Filamentation in Fused Silica by Use of Femtosecond Infrared Laser Pulses

Wavelength dependence of femtosecond laser-induced damage threshold of optical materials

Interaction of Dielectrics with Femtosecond Laser Pulses: Application of Kinetic Approach and Multiple Rate Equation

Femtosecond Laser-Induced Breakdown of Multilayers and Gold Film

Nonlinear energy absorption during optical breakdown in bulk dielectrics

Mechanisms of femtosecond laser-induced breakdown and damage in MgO

Direct Observation of the Reversible and Irreversible Processes in Femtosecond Laser-Irradiated Fused Silica at the Near-Damage-threshold Fluence

Molecular Dynamics Simulation Of Ultra-Fast Thermal Transition In Thin Foil Irradiated By High Power Ultra-Short Laser

Simple Model for Optical Breakdown Threshold for Water Induced by Pulse Laser

Subwavelength periodic plasma structures formed during the laser-pulse-induced breakdown within the transparent dielectric

Transient Electron Temperature and Density Changes in Water Breakdown Induced by Femtosecond Laser Pulses

The Role of Plasma Shielding in Double-Pulse Femtosecond Laser-Induced Breakdown Spectroscopy

Interaction between sub-picosecond laser and fused silica

Formation mechanisms of sub-wavelength ripples during femtosecond laser pulse train processing of dielectrics

Breakdown Spectroscopy Induced by Nonlinear Interactions of Femtosecond Laser Filaments and Multidimensional Plasma Gratings