Fabrication of large-scale α-Si3N4 nanotubes on Si(1 1 1) by hot-wall chemical-vapor-deposition with the assistance of Ga 2O3

Qinqin Wei,ChengShan Xue,Zhencui Sun,Huizhao Zhuang,Wentian Cao,Shuyun Wang,Zhihua Dong
DOI: https://doi.org/10.1016/j.apsusc.2004.01.058
IF: 6.7
2004-01-01
Applied Surface Science
Abstract:Large-scale α-Si3N4 nanotubes were synthesized on Si(111) by hot-wall chemical-vapor-deposition (CVD) with the assistance of Ga2O3. The cylindrical structures were as long as 30um with the inside diameters ranging between 20 and 60nm and the outside diameters ranging between 40 and 100nm. Scanning electron microscope (SEM), X-ray diffraction (XRD), transmission electron microscope (TEM) and high-resolution TEM (HRTEM) were used to characterize the size, composition and the structure of the samples.
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