Abstract:Patterned nanostructure materials have important applications in photonic crystals, SERS, micro / nanodevices etc [ 1 ] . Conventional nanofabrication technologies for the patterned nanostructures mainly rely on semiconductor micromachining techniques, such as photo and electron beam lithography [ 2, 3 ] . Due to the light diffraction limit and poor throughput, these conventional lithography techniques are reaching their resolution limits and have relatively high costs. Unconventional lithography techniques including colloidal lithography [ 4, 5 ] , self-assembly [ 6, 7 ] etc. thus appear to meet increasing demand for nanofabrication with smaller features, lower cost and more complicated geometries. This focus collection introduces recent advances in unconventional lithography for understanding [ 8 ] . Imbraguglio and Perego et al developed a route to prepare periodic Si nanostructures based on diblock copolymer ( DBC ) masks and reactive ion etching ( RIE ) and investigated the in ﬂ uence of the feature size on the etch rate of Si [ 9 ] . The decrease of the etch depth and etch rate was observed in the mask with the smallest feature size. They transferred the nanometric cylindrical pattern in DBC into a Si substrate. They also investigated the structural and physicochemical in ﬂ uences on the resulting nanostructured Si in order to delineate of various RIE pattern effects. They successfully realized the sub 20 nm features on silicon substrate. Borah et al demonstrated an effective approach to fabricate nanoscale silicon patterns by transferring the PDMS cylindrical and spherical patterns to underlying silicon by an etching processes, which showed promise in guiding self-assembly and

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Undulate Microarray Fabrication on Polymer Film Using Standing Surface Acoustic Waves and Ultraviolet Polymerization

Method for fabrication of paper-based microfluidic devices by alkylsilane self-assembling and UV/O3-patterning.

A UV‐Resistant Heterogeneous Wettability Patterned Surface

Development of SiO2 UV-curable materials and their fine-patterning using sol-gel method

Surface Modification of Poly(dimethylsiloxane)-fabricated Microfluidic Chip by UV Radiation

Fabrication of silicon-based multilevel nanostructures via scanning probe oxidation and anisotropic wet etching

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One-step Ion Beam Irradiation Manufacture of 3D Micro/nanopatterned Structures in SiC with Tunable Work Functions

Fabrication of Periodic, Flexible and Porous Silicon Microwire Arrays with Controlled Diameter and Spacing: Effects on Optical properties

Patterning Surfaces on Azo-Based Multilayer Films Via Surface Wrinkling Combined with Visible Light Irradiation.

Unconventional Lithography for Patterned Nanomaterials

One-step UV lithography for activation of inert hydrocarbon monolayers and preparation of protein micropatterns

Fabrication and Characterization of Stable Ultrathin Film Micropatterns Containing CdS Nanoparticles

Nanometer Scale Pattern Replication Using Electron-Beam Direct Patterned Sio2 As the Etching Mask

Surface topography by water jet-guided laser texturing on wettability of monocrystalline silicon