Optimization Design and Fabrication of Photonic Crystal Waveguides Based on Soi Using 248-Nm Deep-Uv Lithography

L Xie,Y Zhang,X Peng,S Xie
DOI: https://doi.org/10.1117/12.520153
2004-01-01
Abstract:In this work, methods of design and fabrication of photonic bandgap structures (PBG) and photonic crystal waveguides based on SOI (silicon on insulator) are presented. In theory; a method that incorporates the plane wave expansion (PWE) method based on supercell with the finite-difference time-domain (FDTD) method with a perfectly matched layer (PML) boundary condition has been investigated. At first, PWE simulation will present a band structure. Then according to the band structure, FDTD tool can simulate a light propagation and can obtain optimized parameters easily. With the method, several photonic crystal devices suitable for 248nm Deep UV lithography and 0.18 mum ion-beam etching are designed and fabricated.
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