A Silicon-Based Ferroelectric Capacitor for Memory Devices

TL Ren,LT Zhang,LT Liu,ZJ Li
DOI: https://doi.org/10.1088/0256-307x/19/3/344
2002-01-01
Chinese Physics Letters
Abstract:We study a silicon-based PbTiO3/Pb(Zr0.53Ti0.47)O3/PbTiO3 capacitor, prepared by an improved sol-gel method. The ferroelectric capacitor has a high remanent polarization of 15 µC/cm2 at a coercive field of about 30 kV/cm, an ultra-low leakage current density of 0.1 nA/cm2, and almost fatigue free properties. It can be used as a promising candidate for ferroelectric memory devices.
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