Reaction Of Diamond Thin Films With Atomic Oxygen Simulated As Low-Earth-Orbit Environment

Jingqi Li,Qing Zhang,Soonfatt Yoon,Jaeshin Ahn,Qiang Zhou,Sigen Wang,Dajiang Yang,Qiang Wang,Zhonghua Li,Jingyi Wang,Qingsong Lei
DOI: https://doi.org/10.1063/1.1513211
IF: 2.877
2002-01-01
Journal of Applied Physics
Abstract:Diamond thin films deposited using a hot filament chemical vapor deposition (CVD) technique have been explored to atomic oxygen simulated as low-earth-orbit environment to examine their erosion-resistance properties. X-ray photoelectron spectroscopy results suggest that the atomic oxygen reacts with the diamond surface and forms ether (C-O-C) and carbonyl (>C=O) configurations. After a 3 h exposure to the atomic oxygen beam with a flux of 2.6x10(16) atoms/cm(2)s, the diamond films only show a small mass loss with a reaction efficiency of 8.28x10(-26) cm(3)/atom. Such a small reaction efficiency suggests that the CVD diamond is highly erosion resistive to atomic oxygen and it can be used as a passivation material in space. (C) 2002 American Institute of Physics.
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