Abstract:The efficacy of oxygen (O) surface terminations on diamond is an important factor for the performance and stability for diamond-based quantum sensors and electronics. Given the wide breadth of O-termination techniques, it can be difficult to discern which method would yield the highest and most consistent O coverage. Furthermore, the interpretation of surface characterization techniques is complicated by surface morphology and purity, which if not accounted for will yield inconsistent determination of the oxygen coverage. We present a comprehensive approach to consistently prepare and analyze oxygen termination of surfaces on (100) single-crystalline diamond. We report on X-ray Photoelectron Spectroscopy (XPS) characterization of diamond surfaces treated with six oxidation methods that include various wet chemical oxidation techniques, photochemical oxidation with UV illumination, and steam oxidation using atomic layer deposition (ALD). Our analysis entails a rigorous XPS peak-fitting procedure for measuring the functionalization of O-terminated diamond. The findings herein have provided molecular-level insights on oxidized surfaces in (100) diamond, including the demonstration of clear correlation between the measured oxygen atomic percentage and the presence of molecular contaminants containing nitrogen, silicon, and sulfur. We also provide a comparison of the sp2 carbon content with the O1s atomic percentage and discern a correlation with the diamond samples treated with dry oxidation which eventually tapers off at a max O1s atomic percentage value of 7.09 +/- 0.40%. Given these results, we conclude that the dry oxidation methods yield some of the highest oxygen amounts, with the ALD water vapor technique proving to be the cleanest technique out of all the oxidation methods explored in this work.

Deuterium-oxygen exchange on diamond (100)—a study by ERDA, RBS and TOF-SIMS

Deuterium uptake, desorption and sputtering from W(110) surface covered with oxygen

Stability of Oxygenated Groups on Pristine and Defective Diamond Surfaces

XPS analysis of molecular contamination and sp2 amorphous carbon on oxidized (100) diamond

First-principles Study of Oxygenated Diamond (001) Surfaces with and Without Hydrogen

Reaction Of Diamond Thin Films With Atomic Oxygen Simulated As Low-Earth-Orbit Environment

Ab initio insights into the interaction mechanisms between H$_2$, H$_2$O, and O$_2$ molecules with diamond surfaces

Oxygen-terminated diamond: insights into the correlation between surface oxygen configurations and work function values

Electron affinity of plasma-hydrogenated and chemically oxidized diamond (100) surfaces

Insights into the surface oxidation modification mechanism of nano-diamond: An atomistic understanding from ReaxFF simulations

Structure of Reconstructed Cu(100) Surface Induced by Dissociative Adsorption of Gaseous Oxygen

Electronic Properties of Hydrogen- and Oxygen-Terminated Diamond Surfaces Exposed to the Air

Ab Initio Study of Hydrogen Desorption from Hydrogenated Diamond (100) Surface

Kinetics of Deuteration in Andradite and Garnet

Ab initio investigation of the effects of B-doping on the adsorption of H2O, H2 and O2 molecules at diamond surfaces

Atomic observation on diamond (001) surfaces with non-contact atomic force microscopy

Precise Characterization of Atomic-Scale Corrosion of Single Crystal Diamond in H2 Plasma Based on MEMS/NEMS

Surface Modification and Deuterium Retention of High Energy Rate Forging W-Y2O3 Exposed to Deuterium Plasma

Erosion resistance of polycrystalline diamond films to atomic oxygen

Using hydrogen isotope incorporation as a tool to unravel the surfaces of hydrogen-treated nanodiamonds

Sub-nanometer-thick native sp2 carbon on oxidized diamond surfaces