Abstract:Etched diffraction grating (EDG) with Bragg reflectors based demultiplexer offers advantages of low insertion loss, compact size and tolerant process, which has been the focus of a great deal of research. The Bragg reflector, consisting of alternating dielectric layers coupled to a homogeneous medium, is a kind of one-dimensional photonic crystal (1-D PC). This paper proposed a design method based on 1-D PC theory to design Bragg-EDG. With this design method, the reflection condition calculated by the 1-D PC theory can be matched perfectly with the diffraction condition. As a result, the shift of central wavelength of diffraction spectra can be improved, while keeping high diffraction efficiency. With a small number of dielectric layers, a Bragg-EDG with broad bandwidth, good channel uniformity and low next-channel crosstalk level can be obtained. Performances of Bragg-EDG for TE and TM-mode are also investigated, and the result shows that the grating by this method has a small polarization dependent loss. The reflection bandwidth of the TE-mode is greater than that of the TM-mode; while for the diffraction efficiency, TM-mode performs better. An analysis of etching deviation was also carried on to study the effect of fabrication errors on the performance of the grating. Simulation results indicate that the diffraction grating designed by this approach is very tolerant concerning fabrication imperfections, and a 10% deviation of the width of the etched trench does not lead to a significant decrease in reflection and diffraction efficiencies of the grating at designed work band.

Effects of Fabrication Errors on the Performance of an EDG Demultiplexer

The Impact of Fabrication Errors on A Flat-Top Grating-Based Planar Waveguide Demultiplexer

Effects Of Surface Roughness On The Performance Of An Etched Diffraction Grating Demultiplexer

Analysis for Fabrication Errors of Arrayed Waveguide Grating Multiplexers

Effects Of Rounded Corners On The Performance Of An Echelle Diffraction Grating Demultiplexer

Effects of Fabrication Errors on the Crosstalk of an AWG

Fabrication Error Analysis of Nonperiodic-Multilayer-dielectric Gratings

Low-loss and Low-Crosstalk Si Etched Diffraction Gratings with Multi-Point Iterative Optimization

Influences on the Deflection Angle of the Pentagonal Prism Due to Dithering and Fabrication Angles Error

Analysis of the Loss Resulting from Point Defects for an Etched Diffraction Grating Demultiplexer by Using the Method of Moments

Fabrication errors simulation of deep etched binary optical elements

Etched Diffraction Grating Wavelength Router with Uniform-Loss and Flat-Passband

Etched Diffraction Grating with One-Dimensional Photonic Crystal Bandgap Theory

Effects of Fabrication Errors on MTF and Diffraction Efficiency for Binary Optical Lens

Design and Optimization of A Silica Waveguide Based Visible Etched Diffraction Grating with Uniform Loss

Elimination of multimode effects in a silicon-on-insulator etched diffraction grating demultiplexer with bi-level taper structure

Using a retro-reflecting echelle grating to improve WDM demux efficiency

Polarization Performance Analysis of Etched Diffraction Grating Demultiplexer Using Boundary Element Method

Analysis of Aberration Characteristics for Etched Diffraction Grating

Experimental and theoretical investigations on cross talk performance of grating-based monolithic integrated wavelength demultiplexers

A metal-coated etched diffraction demultiplexer with a low polarization dependent loss