The Impact of Fabrication Errors on A Flat-Top Grating-Based Planar Waveguide Demultiplexer

Chun-Ting Lin,Yang-Tung Huang,Jung-Yaw Huang
DOI: https://doi.org/10.1143/jjap.46.7356
IF: 1.5
2007-01-01
Japanese Journal of Applied Physics
Abstract:The spectral performance of a demultiplexer is significantly affected by the phase and amplitude errors due to fabrication errors. We estimate the impact of fabrication errors on a flat-top grating-based planar waveguide demultiplexer using a design example. Simulation results show that the photomask resolution resulting in a phase error should be lower than 40 nm when a crosstalk criterion of -30 dB is given. The impact of amplitude errors is not distinct until the reduced amount of the facet width is greater than 0.5 µm and the grating side-wall angle offset from the vertical is larger than 1°.
What problem does this paper attempt to address?