Abstract:Ultracompact silicon-based arrayed waveguide gratings (AWGs) with low loss and low crosstalk are essential for on-chip optical interconnect and miniaturized spectroscopic analysis systems. In our previous research, we demonstrated the crosstalk reduction by utilizing constant projection period for phased array waveguide on the tangent line to the grating pole to reduce the imaging error induced by phased array waveguide end point positions [1] and using deep etching waveguides at the interface of free propagation region to further decrease the footprint of phase region of an AWG to reduce fabrication imperfections induced phase error [2] . Here we first study the effect of curved waveguides in the phased array of 16 × 400 GHz AWGs on the adjacent crosstalk of output channels. According to the AWGs made in our fabrication platform and the testing results of five dies from one wafer at different locations, the AWGs with equal length of single-mode curved waveguides have an average adjacent crosstalk level of ∼ 4 dB smaller than those with equal length of narrow single-mode waveguides composed of straight and curved waveguides in their phased array. Based on the design of equal curved waveguide length in phased array, in combination with our reported approaches on crosstalk reduction, 16 × 200 GHz, 8 × 800 GHz and 8 × 1250 GHz AWGs are fabricated. For characterization, five dies including all designs from different locations of the fabricated wafer are tested. Experimental results show that among these five dies, the best adjacent crosstalk levels are less than − 21.97 dB, −25.72 dB, −24.83 dB and the worst adjacent crosstalk levels are less than − 20.51 dB, −25.03 dB, −24.34 dB for 16 × 200 GHz, 8 × 800 GHz and 8 × 1250 GHz AWGs with FPR angle of 120°, respectively, within the passband width of 25 % channel spacing. The on-chip insertion losses for all output channels of these fabricated AWGs are less than 3 dB.

Effects of Fabrication Errors on the Crosstalk of an AWG

Analysis for Fabrication Errors of Arrayed Waveguide Grating Multiplexers

Crosstalk Between Two Nonparallel Waveguides in AWG Demultiplexer

Theoretical Investigation on the Influence of Phase Errors in Awg

Effect of Manufacturing Tolerances on Characteristics of Arrayed Waveguide Grating Multiplexers

The Impact of Fabrication Errors on A Flat-Top Grating-Based Planar Waveguide Demultiplexer

Effects of Fabrication Errors on the Performance of an EDG Demultiplexer

Crosstalk reduction for Arrayed waveguide gratings on Silicon-on-Insulator platform

Crosstalk characteristics of concave grating demultiplexer

Design and Fabrication Optimization of Low-Crosstalk Silicon Arrayed Waveguide Gratings with 32 Channels and 100-Ghz Spacing

Analysis and Optimization of the Arrayed-Waveguide Grating Device with Total Internal Reflection Mirrors Based on Silicon-on-insulator Material

Sources of Crosstalk in Grating Based Monolithically Integrated Waveguide Demultiplexers

Experimental and theoretical investigations on cross talk performance of grating-based monolithic integrated wavelength demultiplexers

Effect of Bending on Transmission Characteristics of Polymeric Arrayed Waveguide Grating Multiplexers

Effects of Trapezoid Core Cross-Sections on Transmission Characteristics of Polymer Arrayed Waveguide Grating Multiplexers

An Improved Design of the Conventional AWG Device and the Perfor mance Analysis

Performance improvement for silicon-based arrayed waveguide grating router.

Fabrication of 17×17 Box-Like Spectral Response of an Arrayed Waveguide Grating

Low-crosstalk Si arrayed waveguide grating with parabolic tapers.

An Efficient Technique for Analyzing Transmission Characteristics of Arrayed Waveguide Grating Multiplexers

Effect of reactive ion etching process on simulation of polymeric arrayed waveguide grating multiplexers