Abstract:Optical metrology is widely used to characterize surface deformations due to the noncontact, full-field, and highly accurate nature of the measurements. In combination with advanced microscopes, optical metrology methods have recently been extended into the microand nanoscales. In measurements that use the moiré (beat pattern produced between gratings of initially equal spacing) method,1–3 gratings act as sensors that record the original deformation of a specimen. Precise preparation of the gratings is therefore required to ensure accurate measurements. Existing technologies for grating fabrication do not meet all the necessary requirements (i.e., production of high-frequency and large-area gratings at low cost) simultaneously. Ordinary photolithography, due to its diffraction limitation, can generally only produce gratings with hundreds of lines per millimeter. Holographic lithography can be used to make gratings with frequencies of up to 4800 lines per millimeter, but there are strict requirements on the optical system and the alignment techniques. Electron beam lithography and focused ion beam lithography can produce fine gratings with up to 10,000 lines per millimeter, but the grating area is very small (micrometer scale).4, 5 We have developed a new moiré grating fabrication method that is based on the nanoimprint lithography (NIL) technique.6 NIL creates nanoscale patterns through mechanical deformation and has low costs, high throughput, and high resolution. This process has already been used in several microelectronic engineering, optical engineering, and bioengineering applications. Our technique can be used to produce gratings with large areas and high frequencies on different specimens, and at fast rates (see Figure 1).7–9 The preparation of the stamp that is used for imprinting is a key issue in our method. When imprinting is conducted at low pressure, a full-contact condition (between the specimen and Figure 1. (a) Grating fabricated on a traditional (millimeter-scale dimensions) specimen (1200 lines per millimeter, cross type).7 (b) Grating fabricated on a thin (<1 m) film specimen (1200 lines per millimeter, cross type).8

Sub-Wavelength Gratings Based on a New Microfabrication Technology

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Fabrication Sub-Micron Gratings Based on Embossing

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Cross-scale Fabrication of Diffraction Grating Based on Self-Rebound Properties of Flexible Substrate

Fabrication of Low-Stray-Light Gratings by Broad-Beam Scanning Exposure in the Direction Perpendicular to the Grating Grooves

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Fabrication Technique of Nano-Grating Using Afm

Fabrication of microfiber-based Bragg gratings with ultraviolet-light exposure

Large-area commercial-grating-quality subwavelength periodic ripples on silicon efficiently fabricated by gentle ablation with femtosecond laser interference via two cylindrical lenses

Novel Method for Fabricating Adjustable Apodized and Chirped Gratings by UV Light Scanning Writting Technology

Fabrication of 200nm period gold free-standing transmission gratings based on nanoimprint lithography

Fabrication of micro-gratings on Au–Cr thin film by femtosecond laser interference with different pulse durations

Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography

Two-Dimensional Grating Fabrication Based on Ultra-Precision Laser Direct Writing System

Method for Fabricating Large-Area Gratings with a Uniform Duty Cycle Without a Spatial Beam Modulator

Fabrication of High-Density Moiré Gratings