Abstract:Optical metrology is widely used to characterize surface deformations due to the noncontact, full-field, and highly accurate nature of the measurements. In combination with advanced microscopes, optical metrology methods have recently been extended into the microand nanoscales. In measurements that use the moiré (beat pattern produced between gratings of initially equal spacing) method,1–3 gratings act as sensors that record the original deformation of a specimen. Precise preparation of the gratings is therefore required to ensure accurate measurements. Existing technologies for grating fabrication do not meet all the necessary requirements (i.e., production of high-frequency and large-area gratings at low cost) simultaneously. Ordinary photolithography, due to its diffraction limitation, can generally only produce gratings with hundreds of lines per millimeter. Holographic lithography can be used to make gratings with frequencies of up to 4800 lines per millimeter, but there are strict requirements on the optical system and the alignment techniques. Electron beam lithography and focused ion beam lithography can produce fine gratings with up to 10,000 lines per millimeter, but the grating area is very small (micrometer scale).4, 5 We have developed a new moiré grating fabrication method that is based on the nanoimprint lithography (NIL) technique.6 NIL creates nanoscale patterns through mechanical deformation and has low costs, high throughput, and high resolution. This process has already been used in several microelectronic engineering, optical engineering, and bioengineering applications. Our technique can be used to produce gratings with large areas and high frequencies on different specimens, and at fast rates (see Figure 1).7–9 The preparation of the stamp that is used for imprinting is a key issue in our method. When imprinting is conducted at low pressure, a full-contact condition (between the specimen and Figure 1. (a) Grating fabricated on a traditional (millimeter-scale dimensions) specimen (1200 lines per millimeter, cross type).7 (b) Grating fabricated on a thin (<1 m) film specimen (1200 lines per millimeter, cross type).8

Fabrication Sub-Micron Gratings Based on Embossing

Fabrication of High-Density Moiré Gratings

Sub-Wavelength Gratings Based on a New Microfabrication Technology

A New Moiré Grating Fabrication Technique Using Hot Embossing Lithography

Sub-microns period grating couplers fabricated by silicon mold

Fabrication of 200nm period gold free-standing transmission gratings based on nanoimprint lithography

Fabrication of grating couplers using submicron silicon mold

Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography

The Technique for Fabricating Submicron Moiré Grating Using FIB Milling

Large Area 50nm Period Grating by Multiple Nanoimprint Lithography and Spatial Frequency Doubling

Fabrication of Metallic Patterns on Highly Curved Substrates Via Nanoimprint Lithography in Association with an Etch-in Process

Fabrication Technique of Nano-Grating Using Afm

Fabrication of Slanted Gratings with High Refractive Index Starting from Master Nanoimprint Mold.

Fabrication of 2D silicon nano-mold by side etch lift-off method

Fabrication of 150 Nm Half-Pitch Grating Templates for Nanoimprint Lithography

Micro/Nano Grating and Its Application to Moire Measurement

Study of Moiré Grating Fabrication on Metal Samples Using Nanoimprint Lithography

Large Area, 38 Nm Half-Pitch Grating Fabrication by Using Atomic Spacer Lithography from Aluminum Wire Grids

Fabrication of High Aspect Ratio Silicon Gratings by Interference Lithography and Potassium Hydroxide Anisotropic Etch Technique

Fabrication of Large Grating by Monitoring the Latent Fringe Pattern

Towards the Fabrication of High-Aspect-Ratio Silicon Gratings by Deep Reactive Ion Etching