Stable Photoluminescence in Low-Temperature Annealed Porous Silicon

DL Zhu,QW Chen,YH Zhang
DOI: https://doi.org/10.1142/s0217984901002920
2001-01-01
Modern Physics Letters B
Abstract:The low-temperature annealing of porous silicon (PS) has been studied in ambient air and vacuum. After air-annealed samples were again stored in air for a period of time, their luminescence exhibited improved stability in comparison to fresh samples. But their luminescence intensity is much weaker than that of fresh samples, and their peak position moves to shorter wavelengths. A stoichiometric oxide SiO2 can easily be formed on PS surfaces if the annealing is performed in vacuum. The SiO2 layer prevents nc-Si from further oxidation and guarantees the luminescence intensity and that peak position remains unchanged with air storage.
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