Growth of Fe Doped Semi-Insulating Inp by Lp-Mocvd

XJ Yan,HL Zhu,W Wang,GY Xu,F Zhou,CH Ma,XJ Wang,HL Tian,JY Zhang,RH Wu,QM Wang
DOI: https://doi.org/10.1117/12.317966
1998-01-01
Abstract:The semi-insulating InP has been grown using ferrocene as a dopant source by low pressure MOCVD. Fe doped semiinsulating InP material whose resistivity is equal to 2.0x10(8)Omega*cm and the breakdown field is Beater than 4.0x10(4)Vcm(-1) has been achieved. It is found that the magnitude of resistivity increases with growing pressure enhancement under keeping TMIn, PH3, ferrocene (Fe(C5H5)(2)) flow constant at 620 degrees C growth temperature. Moreover, the experimental results which resistivity varies with ferrocene mole fraction are given. It is estimated that active Fe doping efficiency; eta, is equal to 8.7x10(-4) at 20mbar growth pressure and 620 degrees C growth temperature by the comparison of calculated and experimental results.
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