Morphological control of nanometer particles in metal-insulator composite thin films

Geyang Li,Liang Wu,Liuqiang Zhang,Pengxing Li
1997-01-01
Abstract:Ag-SiO2 metal-insulator composite thin film has been prepared by the magnetron co-sputtering Ag and SiO2 by rotating and heating the substrates at various temperatures. The microstructure has been studied by TEM and the resistivity has been measured. The results indicate that the morphology of Ag could be controlled by rising the substrate temperature. When the substrate temperature is kept above 300��C, Ag particles are smaller than 100nm (10-100nm) and the resistivity of films varies in the range of 102-106�̦ء�cm by heating substrate.
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