Control of the Magnetic Film Composition and Uniformity in Magnetron Sputtering

YM Zhu,XY Li,XP Song,Q Chen
DOI: https://doi.org/10.3321/j.issn:1002-185x.2004.07.025
2004-01-01
Abstract:The SmCo films were deposited by magnetron sputtering equipment with turn sputtering. The composition and uniformity of the films were adjusted by varying the interval time and the sputtering power. EDAX analyses showed that the film composition can be optimized by controlling the sputtering current. The results of AES analyses proved that the optimized composition is uniform along the cross-sections of the film. TEM electron diffraction indicated that the structure of the as-deposited film is amorphous. After anneal at above 400degreesC the film began crystalline. VSM results showed that theas-sputtered film is magnetically soft. After crystallization the film showed hard magnetic behavior. After annealing at 450degreesC magnetic anisotropy developed and the coercivity of the film maximized.
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