A study of top layer of TiO2 membrane prepared by chemical vapor deposition method

Dingkun Peng,Pinghua Yang,Zitao Liu,Guangyao Meng
1997-01-01
Abstract:This paper reports the growth of TiO2 thin films deposited on porous alpha-Al2O3 ceramic substrates by thermal chemical vapor deposition(CVD) and plasma enhanced CVD processes using TiCl4 or Ti(OC4H9)(4) as the source material. The growth manner and rate of TiO2 films as well as the structure and the surface morphology of the films are observed by XRD and SEM. And their growth mechanism is discussed. We also evaluated the gas permeability of the ceramic membranes modified with TiO2 top layer by CVD methods.
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