Investigation of triple diffusion process for MOS-controlled thyristor

Xuening Li,Maocheng Tang,Zhaoji Li,Yuan Li,Yushu Liu
1996-01-01
Tien Tzu Hsueh Pao/Acta Electronica Sinica
Abstract:The key fabricating process of MCT, the triple diffusion, is investigated. The process conditions were obtained by process simulator SUPREM-III. The measurement results of spreading resistance, bevel and sheet resistance indicate that optimum design and fabrication are fulfilled. The new structure of DOFMCT with turn off capability of 134A/cm2 is designed and fabricated.
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