Simulation and Analysis of MCT Device Based on VLD Technology

Jianxin RUAN,Wanjun CHEN,Ruize SUN,Zhaofei PENG,Bo ZHANG
DOI: https://doi.org/10.3969/j.issn.1681-1070.2014.08.006
2014-01-01
Abstract:MOS controlled thyristor (MCT) which is used in pulsed power field is investigated by numerical simulation tool in this paper. A new process based on VLD(variable lateral doping) technology for MCT is proposed and its advantages are also found by simulation. Current amplification factor a of NPN transistor in MCT is optimized by adjust the size of mask and the dose of impurity implantation.The dose of impurity implantation is identified by simulation.The simulation results indicate that the current ability of conventional MOS controlled thyristor (CMCT) is only half of the VLD MOS controlled thyristor (VMCT). The breakdown voltage and turn off voltage of VMCT are the same as CMCT.However, compared with CMCT, a mask is saved in the VMCT process.
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