Structural Characteristics Of Diluted Magnetic Semiconductor Zn1-Xmnxse Films Grown By Hot-Wall Epitaxy On Gaas(100) Substrates

J Wang,Cs Zhu,Auh Qureshi,Dm Huang,X Wang,Xl Shen
DOI: https://doi.org/10.1016/0022-0248(95)00055-0
IF: 1.8
1995-01-01
Journal of Crystal Growth
Abstract:In this paper, we report the growth of Zn1-xMnxSe films on GaAs(100) substrates by hot wall epitaxy up to an Mn concentration of x = 0.52. The crystalline structures of the Zn1-xMnxSe layers were characterized by X-ray diffraction and Raman scattering. At a low growth rate of 1 mu m/h, Zn1-xMnxSe films have demonstrated pure zinc-blende structure up to a composition of x = 0.50. At a high growth rate of above 2 mu m/h, the films exhibited mixed phases of zinc-blende and hexagonal structures over the range 0.19 less than or equal to x less than or equal to 0.52. The achievement of (111) oriented single crystal Zn1-xMnxSe epilayers on GaAs(100) substrates and its explanation are presented.
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