Abstract:For nitrogen-doped Czochralski (NCZ) silicon, it is well known that nitrogen (N) and oxygen (O) impurities can interact to form nitrogen–oxygen shallow thermal donors (N–O STDs); moreover, the N impurities can be involved into heterogeneous nucleation to facilitate the formation of grown-in oxide precipitates. However, how the N impurities participate in the growth of grown-in oxide precipitates during the post-anneal remains unclear. Besides, the correlation between the formation of N–O STDs and the growth of grown-in oxide precipitates is yet to be revealed. In this work, the effects of pre-anneals at temperatures of 900–1200 °C on the formation of N–O STDs at 650 °C in NCZ silicon have been first investigated. Thus, it has been found that the more significant growth of grown-in oxide precipitates during the pre-anneal, which consumes much more N impurities, leads to forming much fewer N–O STDs. This finding stimulates us to explore the mechanism for the participation of N impurities in the growth of grown-in oxide precipitates. To this end, the capture of N impurities by the oxide precipitates, on the one hand, and the release of N impurities from the oxide precipitates, on the other hand, have been investigated by two systematically constructed experiments. The obtained results enable us to reasonably propose that the N impurities participating in the growth of grown-in oxide precipitates predominately reside at the oxide precipitate/Si interfaces, which reduces the interfacial energies, thus favoring the growth of grown-in oxide precipitates. Such a viewpoint is well supported by the density functional theory calculations. In a word, this work has gained an insight into the mechanism for the participation of N impurities in the growth of grown-in oxide precipitates, starting from exploring the correlation between the formation of N–O STDs and the growth of grown-in oxide precipitates.

Heat treatment behavior of nitrogen impurity in N-doped silicon monocrystal

Effect of heat treatment on the optical and electrical properties of nitrogen-doped silicon samples

The behaviour of nitrogen in silicon during heat treatment at high temperature

Effect Of Nitrogen Doping On The Dissolution Of Oxygen Precipitates In Czochralski Silicon During Rapid Thermal Annealing

Thermal Acceptor Formation in Nitrogen-Doped Silicon

Enhanced Oxygen Precipitation In Neutron-Irradiated Nitrogen-Doped Czochralski Silicon Crystal

Kinetics of Nitrogen Indiffusion in Czochralski Silicon Annealed in Nitrogen Ambient

Oxygen Precipitation of Nitrogen-Doped Czochralski Silicon Subjected to Multi-Step Thermal Process

Thermal Stability of Oxygen Precipitates in Nitrogen-Doped Czochralski Silicon

Participation of Nitrogen Impurities in the Growth of Grown-in Oxide Precipitates in Nitrogen-Doped Czochralski Silicon

On the Mechanism Underlying the Elimination of Nitrogen-Oxygen Shallow Thermal Donors in Nitrogen-Doped Czochralski Silicon at Elevated Temperatures

Stress Dependent Structure of Annealed Nitrogen-Doped Cz-Si

Effect of Heat Treatment on Carbon in Multicrystalline Silicon

Formation of the thermal donors in the hydrogen-implanted nitrogen-doped silicon crystal

Direct-Nitridation of Silicon by Heat-Treating at High Temperature in Nitrogen Ambience

Oxygen precipitation in N-doped silicon monocrystal

Thermal Nitridation Kinetics of Silicon Wafers in Nitrogen Atmosphere During Annealing

Investigation of Nitrogen Behaviors During Czochralski Silicon Crystal Growth

Effects of nitrogen on dislocations in silicon during heat treatment

Donor behavior of nitrogen impurity in nitrogen-doped CZ-Si

Defect structure of nitrogen doped czochralski silicon annealed under enhanced pressure