Patterned Graphene Functionalization Via Mask-Free Scanning of Micro-Plasma Jet under Ambient Condition

Dong Ye,Shu-Qun Wu,Yao Yu,Lin Liu,Xin-Pei Lu,Yue Wu
DOI: https://doi.org/10.1063/1.4866788
IF: 4
2014-01-01
Applied Physics Letters
Abstract:In this work, a mask-free method is introduced for patterned nitrogen doping of graphene using a micro-plasma jet under ambient condition. Raman and X-ray photoelectron spectroscopy spectra indicate that nitrogen atoms are incorporated into the graphene lattice with the two-dimensional spatial distribution precisely controlled in the range of mm down to 10 μm. Since the chemistry of the micro-plasma jet can be controlled by the choice of the gas mixture, this direct writing process with micro-plasma jet can be a versatile approach for patterned functionalization of graphene with high spatial resolution. This could have promising applications in graphene-based electronics.
What problem does this paper attempt to address?