Resistive Switching Behaviour of A Tantalum Oxide Nanolayer Fabricated by Plasma Oxidation

G. S. Tang,F. Zeng,C. Chen,S. Gao,H. D. Fu,C. Song,G. Y. Wang,F. Pan
DOI: https://doi.org/10.1002/pssr.201206534
2013-01-01
Abstract:We investigate the resistive switching behaviour of a tantalum oxide nanolayer-based nonvolatile memory with Pt/TaO5-x/TaN structure, which was prepared at room temperature through a processing compatible with CMOS technology. The tantalum oxide nanolayer with thickness of about 5 nm was fabricated by plasma oxidation of TaN films. The switching mechanism can be explained by the modulation of the local oxygen-deficient conduction channel resulting from oxygen ions drift. This Letter represents a cost-efficient method for developing nanoscale restive switching nonvolatile memories. (C) 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
What problem does this paper attempt to address?