Engineering resistive switching behavior in TAO<inf>x</inf> based memristive devices for non-von Neuman computing applications

Jingxian Li,Teng Zhang,Qingxi Duan,Lidong Li,Yuchao Yang,Ru Huang
DOI: https://doi.org/10.1109/CSTIC.2018.8369200
2018-01-01
Abstract:Memristive devices are nowadays widely investigated for non-von Neuman computing, such as neuromorphic and in-memory computing, where memristors with incremental switching behavior are favorable for neuromorphic hardware while binary resistance state with high on/off ratio is desirable for the in-memory logic. Here we report the engineering of the resistive switching behavior in tantalum oxide based memristive devices by introducing an ion diffusion limiting layer Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> at the TiN/TaO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">x</sub> interface in order to satisfy the different requirements of various applications. This study could provide clues to the optimization of memristive devices for future neuromorphic and logic applications.
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