Abstract:Sputtered Cu/Si thin films were experimentally prepared at different sputtering pressures and characterized using X-ray diffraction (XRD) and an atomic force microscope (AFM). Simultaneously, an application-oriented simulation approach for magnetron sputtering deposition was proposed in this work. In this integrated multiscale simulation, the sputtered atom transport was modeled using the Monte Carlo (MC) and molecular dynamics (MD) coupling method, and the deposition of sputtered atoms was simulated using the MD method. This application-oriented simulation approach was used to simulate the growth of Cu/Si(100) thin films at different sputtering pressures. The experimental results unveiled that, as the sputtering pressure decreased from 2 to 0.15 Pa, the surface roughness of Cu thin films gradually decreased; (111)-oriented grains were dominant in Cu thin films and the crystal quality of the Cu thin film was gradually improved. The simulation results were consistent with the experimental characterization results. The simulation results revealed that the transformation of the film growth mode from the Volmer-Weber growth mode to the two-dimensional layered growth mode resulted in a decrease in the surface roughness of Cu thin films; the increase in the amorphous compound CuSix and the hcp copper silicide with the decrease in the sputtering pressure was responsible for the improvement of the crystal quality of the Cu thin film. This work proposed a more realistic, integrated simulation scheme for magnetron sputtering deposition, providing theoretical guidance for the efficient preparation of high-quality sputtered films.

Nanostructure formation of Cu/Si(100) thin film induced by ion beam bombardment

Formation of Fe Nano-Ripples and Nano-Structures on Si Surfaces Induced by Ion bombardment

Ion-Sputter-Induced Nanodots on Si(110): Ion Energy Dependence

Nanostructuring of Si(100) by Normal-Incident Ar+ Ion Sputtering at Low Ion Flux

Nanopatterning of Si(110) Surface by Ion Sputtering: an Experimental and Simulation Study

Scanning Tunneling Microscopy Study of Surface Reconstruction Induced by N Adsorption on Cu（100） Surface

On the Microcrystal Structure of Sputtered Cu Films Deposited on Si(100) Surfaces: Experiment and Integrated Multiscale Simulation

Formation Of Nanocrystalline Tin Film By Ion-Beam-Enhanced Deposition

Surface microstructure and wetting of SiC ceramic modified by ion bombardment

Microfabrication of Nanoscale Cluster Chains on A Patterned Si Surface

Formation of irregular morphology on nanostructured surface by gas cluster ion beam

Research on Deforming Mechanism of Nanocrystalline Cu Thin Film under Contact Deformation

Nanopatterning of metal-coated silicon surfaces via ion beam irradiation: Real time x-ray studies reveal the effect of silicide bonding

Microstructure and micromorphology of Cu/Co nanoparticles: Surface texture analysis

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Nanopattern on Carbon and by Carbon

Patterned growth of self-assembled silicon nanostructures by ion implantation and electron beam annealing

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Repeated 3D Nucleation in Electroless Cu Deposition and the Grain Boundary Structure Involved

Surface Morphology Evolution of Si(110) by Ion Sputtering As A Function of Sample Temperature

Laser Induced Surface Nanostructuring on Ultra-Thin Amorphous Si Films